Description
? Positive Resist PR1-12000A is a positive tone photoresist designed for 365 or 436 nm
wavelength exposure, using tools such as wafer steppers, scanning projection aligners,
proximity printers contact printers. PR1-12000A excels in applications when superior
adhesion is required. Use of adhesion promoters, such as HMDS is not recommended
with PR1-12000A.
? These are the advantages of PR1-12000A over other resists: - superior resolution capability - fast photospeed - substrate adhesion which is superior to that of any commercial positive resist - ease of removal after RIE process - shelf life exceeding 1 year at room temperature storage.
? The formulation processing of PR1-12000A were designed with regard to
occupational environmental safety. The principal solvent in PR1-12000A is 1
methoxy-2-propanol development of PR1-12000A is accomplished in a basic water
solution.
Properties
? Solids content (%) 40-45
? Principal solvent 1-methoxy-2-
propanol
? Appearance light yellow liquid
? Coating characteristic very uniform,
striation free
? Film thickness after 100°C oven bake for 15 minutes
Coating spin speed, 40 s spin (rpm): (nm)
800 23500-24500
2300 14800-15200
3000 11800-12200
? Sensitivity (mJ/cm2 for 1 μm thick film):
365 nm exposure wavelength 70
436 nm exposure wavelength 40
? Guaranteed shelf life at 25°C storage (years) 1
1. Application of resist by spin coating at ed spin speed for 40 s.
2. Application of Edge Bead Remover EBR1 to bottom edge of the coated wafer for 10
s, until 5 s before completion of spin cycle.
3. 100°C bake in a bake oven for 30 minutes or 120oC hotplate bake for 180 s.
4. Resist exposure with a tool emitting 365, 406 or 436 nm wavelengths.
5. Resist development in Resist Developer RD6 by spray or immersion.
6. Resist rinse in deionized water until water resistivity reaches prescribed limit.
7. Drying of resist.
8. Removal of resist in Resist Remover RR4 or in acetone.
The above procedure refers to substrates, which are good conductors of heat such as silicon,
GaAs etc. Bake times need to be increased 3.5 times for substrates, which are poor
conductors of heat such as glass.
Hling Precautions
Positive Resist PR1-12000A is a flammable liquid. Hle it with care. Keep it away
heat, sparks flames. Use adequate ventilation. It may be harmful if swallowed or touched.
Avoid contact with liquid, vapor or spray mist. Wear chemical goggles, rubber gloves
protective coating.